Analysis of the Material Removal Rate and Smoothing Effect of Active Fluid Jet Polishing

V. Singh Negi[1], H. Garg[1], S. Kumar[2], V. Karar[2], U. Tiwari[1]
[1]Academy of Scientific and Innovative Research (AcSIR), CSIR-Central Scientific Instruments Organisation (CSIR-CSIO) Campus, Chandigarh, India, India
[2]CSIR-Central Scientific Instruments Organisation, Chandigarh, India, India
Published in 2019

Active fluid jet polishing is a sub-aperture polishing process used in the optical fabrication of complex surfaces. Correction of surface irregularities during the polishing process is a challenging process. Quality of optical surface depends on smoothing action during fine and correction polishing. In this paper, polishing analysis of active fluid jet polishing is discussed. In active fluid jet polishing, the polishing compound stream is used to press a cylindrical tip against the optical surface. Polishing action is created by polishing fluid, pressure, and relative velocity of the carrier placed at the end of the cylindrical tip. During the polishing process, a tool influence function is convoluted along the polishing path to uniformly polish the surface. Optical surface material removal rate during polishing depends on contact pressure, relative velocity, properties of the polishing slurry, carrier, and workpiece. A mathematical model describing the kinematic and pressure distribution is described. Effect of pressure, spot size and tool speed on the material removal rate and surface irregularities are discussed.