Fountain Flow Effects on Electrodeposition on a Rotating Wafer
Application ID: 13865
This example extends the analysis made in the model Electrodeposition on a Resistive Patterned Wafer by including the diffusion and convection of copper ions in the electrolyte.
The coupled mass transport convection-diffusion effects are of interest in this type of reactor since they will be accentuated towards the rim of the wafer, limiting the current density. This will counter balance the activation overpotential which is highest at the rim due to electric current conduction effects in the wafer. By the design of the reactor, the relation between mass transport and activation potential effects can be optimized to make the current distribution over the wafer more uniform.
This application was built using the following:Electrodeposition Module
The combination of COMSOL® products required to model your application depends on the physics interfaces that define it. Particular physics interfaces may be common to several products (see the Specification Chart for more details). To determine the right combination of products for your project, you should evaluate all of your needs in light of each product's capabilities, consultation with the COMSOL Sales and Support teams, and the use of an evaluation license.