In most industrial systems, the species transport in laminar flow differs by several orders of magnitude between convection and diffusion. This model serves as an introduction to the modeling of systems where a mass balance is coupled...
Porous catalyst particles are widely used in the chemical industry and are extensively treated in the chemical engineering literature. The catalyst pellets are, in most cases, fluidized by the action of a gas or liquid flowing through...
In this model the eigenfrequencies for a simple in-plane framework with point mass and point mass moment of inertia is calculated. The framework is modeled using the in-plane Euler beam application mode. The calculated results are...
In this example you will build and solve a 3D beam model using the 3D Euler Beam application mode. This model shows how a thermally induced deformation of a beam is modeled. Temperature differences are applied across the top and...
A benchmark model where a thick plate exposed to pressure on the top surface is analyzed. The solution is compared with a NAFEMS benchmark solution.
In this model, a plate with a hole is loaded above the elastic limit. Since it is a thin plate with in-plane loading, plane stress condition can be assumed. The model uses the Plane Stress application mode, and the material is assumed...
In static mixers, also called motionless or in-line mixers, the fluid is pumped through a pipe containing stationary blades. This mixing technique is particularly well suited for laminar flow mixing since it gives small pressure losses in...
Diffusion in a dilute solution is described by Fick’s law for diffusion. This law accounts for the interaction between the solvent and the solute only, since the dissolved species do not encounter other molecules than the one of the...
In this example, an experimental set-up for studies of the absorption of chlorine, diluted in hydrogen, in a caustic solution containing low amounts of carbonate is modeled. Hydrogen is generated at the cathode in many electrolysis...
Chemical vapor deposition (CVD) is an important step in the process of manufacturing microchips. One of the common applications is the deposition of silicon on wafers at low pressure. Low pressure reactors are used to get a high...